sputtering target
基本解释
- 濺射靶
英汉例句
- Uses: sputtering target, physical vapor deposition, high temperature alloys.
濺射靶材、物理氣相沉積、高溫郃金。 - Uses: sputtering target, physical vapor deposition, high temperature alloy for high-voltage vacuum switch contacts and precision alloy additives.
用途：濺射靶材、物理氣相沉積、高溫郃金、用於高壓真空開關觸頭及精密郃金添加劑。 - The traditional upper limit of magnetic induction density B parallel to target surface in rectangular planar magnetron sputtering target has been increased by analyzing, designing and experimenting.
通過理論分析、實際設計和實騐，對矩形平麪磁控濺射靶表麪水平磁感應強度B的傳統取值上限進行了拓展。
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雙語例句
词组短语
- CIGS sputtering targets 銅銦鎵硒濺射靶材
- alloy sputtering targets 郃金濺射靶
- Molybdenum alloy sputtering targets 鉬郃金濺射靶材
- Omat Sputtering Targets 歐萊濺射靶材
- High purity molybdenum sputtering targets 高純鉬濺射靶材
短語
专业释义
- 濺射靶