wet gate oxidation process
常见例句
- Started with silicon wafer our TFFEC processes consist of wet isotropic chemical etching for cone formation, oxidation and etching for tip sharpening and self-aligned gate process.
我们用硅材料为基体，用各向同性的湿法化学腐蚀工艺制出尖端，用氧化增尖和自对准栅极工艺制成TFFEC—薄膜场发射阴极。 返回 wet gate oxidation process