sputtering target

常见例句

Uses: sputtering target, physical vapor deposition, high temperature alloys.
溅射靶材、物理气相沉积、高温合金。
Uses: sputtering target, physical vapor deposition, high temperature alloy for high-voltage vacuum switch contacts and precision alloy additives.
用途：溅射靶材、物理气相沉积、高温合金、用于高压真空开关触头及精密合金添加剂。
The traditional upper limit of magnetic induction density B parallel to target surface in rectangular planar magnetron sputtering target has been increased by analyzing, designing and experimenting.
通过理论分析、实际设计和实验，对矩形平面磁控溅射靶表面水平磁感应强度B的传统取值上限进行了拓展。
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